Photolithographic patterning of bihelical tracks onto conical substrates

Alan Purvis; Richard McWilliam; Simon Johnson; Nicholas L. Seed; Gavin L. Williams; Andrew Maiden; Peter Ivey

doi:10.1117/1.2824377

1 October 2007 Photolithographic patterning of bihelical tracks onto conical substrates

Alan Purvis, Richard McWilliam, Simon Johnson, Nicholas L. Seed, Gavin L. Williams, Andrew Maiden, Peter Ivey

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 6, Issue 4, 043015 (October 2007). https://doi.org/10.1117/1.2824377

Abstract

We demonstrate the direct photolithographic patterning of a grossly nonplanar substrate by creating 62-μm helical tracks on a 22-mm-high cone. The projection of focused light onto the 3-D surface is achieved using a computer-generated hologram (CGH) suitably illuminated so as to create the required pattern on the photoresist-coated surface. The approach adopted forms the basis of a novel method for patterning nonplanar structures. We address the key challenges encountered for the implementation of holographic photolithography in three dimensions, including mask design and manufacture, exposure compensation, mask alignment, and chemical processing. Control of linewidth and resolution over the nonplanar surface is critical. We describe the methods adopted and critically assess the structures created by this process. The bihelical cone is representative of a broadband, high-frequency coil-like structure, known in wireless communications as a log-periodic antenna.

©(2007) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Alan Purvis, Richard McWilliam, Simon Johnson, Nicholas L. Seed, Gavin L. Williams, Andrew Maiden, and Peter Ivey "Photolithographic patterning of bihelical tracks onto conical substrates," Journal of Micro/Nanolithography, MEMS, and MOEMS 6(4), 043015 (1 October 2007). https://doi.org/10.1117/1.2824377

Published: 1 October 2007

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