Articles

Nonlinear interferometric lithography for arbitrary two-dimensional patterns

[+] Author Affiliations
Sean J. Bentley

Adelphi University, Department of Physics, Garden City, New York 11530

J. Micro/Nanolith. MEMS MOEMS. 7(1), 013004 (February 08, 2008). doi:10.1117/1.2838591
History: Received May 30, 2007; Revised November 02, 2007; Accepted November 12, 2007; Published February 08, 2008
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A new, relatively simple experimental technique for generating arbitrary, two-dimensional patterns with high visibility and higher resolution than allowed by the Rayleigh criterion has been developed. The theoretical and experimental details of the method, based on repeated phase-coherent interference of four beams on a multiphoton absorber, are described. A sample pattern generated by numerical computer simulation of the technique is also shown.

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© 2008 Society of Photo-Optical Instrumentation Engineers

Citation

Sean J. Bentley
"Nonlinear interferometric lithography for arbitrary two-dimensional patterns", J. Micro/Nanolith. MEMS MOEMS. 7(1), 013004 (February 08, 2008). ; http://dx.doi.org/10.1117/1.2838591


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