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Application of quantitative structure property relationship to the design of high refractive index 193i resist

[+] Author Affiliations
Heping Liu

University of Queensland, Centre for Magnetic Resonance and Australian Institute for Bioengineering and Nanotechnology, St. Lucia, Queensland 4072, Australia

Idriss Blakey

University of Queensland, Centre for Magnetic Resonance and Australian Institute for Bioengineering and Nanotechnology, St. Lucia, Queensland 4072, Australia

Willard E. Conley

Freescale Semiconductor, 7700 West Parmer Lane, Austin, Texas 78729

Graeme A. George

Queensland University of Technology, School of Physical Sciences, Brisbane, Queensland, 4001, Australia

David J. T. Hill

University of Queensland, School of Microbial and Molecular Science, St. Lucia, Queensland 4072, Australia

Andrew K. Whittaker

University of Queensland, Centre for Magnetic Resonance and Australian Institute for Bioengineering and Nanotechnology, St. Lucia, Queensland 4072, Australia

J. Micro/Nanolith. MEMS MOEMS. 7(2), 023001 (June 25, 2008). doi:10.1117/1.2908937
History: Received May 23, 2007; Revised November 09, 2007; Accepted December 19, 2007; Published June 25, 2008
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A robust quantitative structure property relationship (QSPR) model with five parameters has been developed from 126 organic compounds for the prediction of refractive index at 589nm. The model and the knowledge of the refractive index dispersion were used in the rational design of new materials for 193-nm immersion lithography. The significance of this model is that the structural descriptors can be readily calculated and the factors that significantly affect refractive index can be easily identified and used to guide the selection of candidates. Using this model, rapid screening of large structure databases is possible in order to find candidates. As an example of this approach, the synthesis of the copolymer of a trithiocyclane-methacrylate derivative, identified by the model, with 2-methyl adamantyl methacrylate is described. The measured refractive index of the copolymer at 589nm agrees well with the value predicted by the model. The new polymer showed a 9.4% increase in refractive index at 193nm compared with the standard ArF resist.

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© 2008 Society of Photo-Optical Instrumentation Engineers

Citation

Heping Liu ; Idriss Blakey ; Willard E. Conley ; Graeme A. George ; David J. T. Hill, et al.
"Application of quantitative structure property relationship to the design of high refractive index 193i resist", J. Micro/Nanolith. MEMS MOEMS. 7(2), 023001 (June 25, 2008). ; http://dx.doi.org/10.1117/1.2908937


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