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Lineshape and morphology study of structures formed using a reconfigurable photomasking element

[+] Author Affiliations
Anna E. Fox

Drexel University, Department of Electrical and Computer Engineering, Philadelphia, Pennsylvania 19104

Adam K. Fontecchio

Drexel University, Department of Electrical and Computer Engineering, Philadelphia, Pennsylvania 19104

J. Micro/Nanolith. MEMS MOEMS. 7(3), 033007 (August 22, 2008). doi:10.1117/1.2970147
History: Received April 11, 2008; Revised June 20, 2008; Accepted June 27, 2008; Published August 22, 2008
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The proposed application of holographically formed polymer dispersed liquid-crystal (H-PDLC) thin films is a real-time dynamically reconfigurable mask for the resist exposure step in the photolithographic process. An adaptable photomask has advantages over traditional binary masks that include multiple fabrication patterns using a single mask, reduction in realignment error between different masks, real-time correction and adjustment of fabricated structures, and the ability to alter the mask pattern during exposure. H-PDLC films, or thin periodic nanostructures of alternating layers of polymer and liquid crystal, have unique electro-optic properties, including the ability to modulate a particular wavelength as a function of bias applied to the film. Structures formed using the H-PDLC photomask device have been compared to similar structures formed with a static photomask using an optical profilometer. Features studied were decreasing lines with a maximum width of 121μm to a minimum width of 84μm. Edge width between structures formed using the H-PDLC mask and static photomask differ by <5%. Additionally, morphology studies have been performed on developed regions of glass and resist formed using a static and an H-PDLC mask to demonstrate that no structural defects exist due to formation under an H-PDLC grating.

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© 2008 Society of Photo-Optical Instrumentation Engineers

Citation

Anna E. Fox and Adam K. Fontecchio
"Lineshape and morphology study of structures formed using a reconfigurable photomasking element", J. Micro/Nanolith. MEMS MOEMS. 7(3), 033007 (August 22, 2008). ; http://dx.doi.org/10.1117/1.2970147


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