Articles

Isopropanol/water as a developer for poly(dimethylglutarimide)

[+] Author Affiliations
Robert W. Johnstone

Simon Fraser University, Institute for Micromachine and Microfabrication Research, 8888 University Drive, Burnaby, British Columbia, V5A 1S6, Canada

Ian G. Foulds

Simon Fraser University, Institute for Micromachine and Microfabrication Research, 8888 University Drive, Burnaby, British Columbia, V5A 1S6, Canada

Manu V. Pallapa

Simon Fraser University, Institute for Micromachine and Microfabrication Research, 8888 University Drive, Burnaby, British Columbia, V5A 1S6, Canada

Ash M. Parameswaran

Simon Fraser University, Institute for Micromachine and Microfabrication Research, 8888 University Drive, Burnaby, British Columbia, V5A 1S6, Canada

J. Micro/Nanolith. MEMS MOEMS. 7(4), 043006 (October 15, 2008). doi:10.1117/1.2990738
History: Received March 25, 2008; Revised July 03, 2008; Accepted July 16, 2008; Published October 15, 2008
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Poly(dimethylglutarimide) (PMGI) is a resist that is commonly used in bilayer and trilayer imaging applications. PMGI can be exposed using various radiation sources including deep UV. Currently, there are only two developers for PMGI reported in the literature: tetramethylammonium hydroxide and tetraethylammonium hydroxide. We introduce a new developer for PMGI, a mixture of isopropanol (IPA) and water. Samples were irradiated with deep UV at 254nm. The IPA/water developer exhibits rapid dissolution of exposed PMGI, of many microns per minute. However, PMGI exhibits high absorption at 254nm, so the development depth is limited. The depth limit, after a critical dose, increases linearly with the exposure dose.

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© 2008 Society of Photo-Optical Instrumentation Engineers

Topics

Water

Citation

Robert W. Johnstone ; Ian G. Foulds ; Manu V. Pallapa and Ash M. Parameswaran
"Isopropanol/water as a developer for poly(dimethylglutarimide)", J. Micro/Nanolith. MEMS MOEMS. 7(4), 043006 (October 15, 2008). ; http://dx.doi.org/10.1117/1.2990738


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