Special Section on Double-Patterning Lithography

Litho-only double patterning approaches: positive–negative versus positive–positive tone

[+] Author Affiliations
Michael M. Crouse

ASML Corporation, 25 Corporate Circle, Albany, New York 12203

Rick Uchida

Tokyo Ohka Kogyo Company, Ltd., 1590 Tabata, Samukawa-machi, Koza-gun, Kanagawa-ken 253–0114, Japan

Youri van Dommelen

ASML Corporation, 25 Corporate Circle, Albany, New York 12203

Tomoyuki Ando

Tokyo Ohka Kogyo Company, Ltd., 1590 Tabata, Samukawa-machi, Koza-gun, Kanagawa-ken 253–0114, Japan

Emil Schmitt-Weaver

ASML Corporation, 25 Corporate Circle, Albany, New York 12203

Masaru Takeshita

Tokyo Ohka Kogyo Company, Ltd., 1590 Tabata, Samukawa-machi, Koza-gun, Kanagawa-ken 253–0114, Japan

Shunder Wu, Robert Routh

ASML Corporation, 25 Corporate Circle, Albany, New York 12203

J. Micro/Nanolith. MEMS MOEMS. 8(1), 011006 (January 26, 2009). doi:10.1117/1.3042219
History: Received May 29, 2008; Accepted August 20, 2008; Published January 26, 2009
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Double patterning is considered the most viable option for 32- and 22-nm complementary metal-oxide semiconductor (CMOS) node development and has seen a surge of interest due to the remaining challenges of next-generation lithography systems. Most double patterning approaches previously described require intermediate processing steps (e.g., hard mask etching, resist freezing, spacer material deposition, etc.). These additional steps can add significantly to the cost of producing the double pattern. Alternative litho-only double patterning processes are investigated to achieve a composite image without the need for intermediate processing steps. A comparative study between positive–negative (TArF-P6239+N3007) and positive–positive tone (TArF-P6239+PP002) imaging is described. In brief, the positive–positive tone approach is found to be a superior solution due to a variety of considerations.

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© 2009 Society of Photo-Optical Instrumentation Engineers

Citation

Michael M. Crouse ; Rick Uchida ; Youri van Dommelen ; Tomoyuki Ando ; Emil Schmitt-Weaver, et al.
"Litho-only double patterning approaches: positive–negative versus positive–positive tone", J. Micro/Nanolith. MEMS MOEMS. 8(1), 011006 (January 26, 2009). ; http://dx.doi.org/10.1117/1.3042219


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