Special Section on Double-Patterning Lithography

30-nm half-pitch metal patterning using Motif™ critical dimension shrink technique and double patterning

[+] Author Affiliations
Janko Versluijs, Jean-François De Marneffe, Danny Goossens, Tom Vandeweyer, Vincent Wiaux, Herbert Struyf, Mireille Maenhoudt

IMEC Kapeldreef 75 B-3001 Leuven Belgium

Mohand Brouri, Johan Vertommen

Lam Research Corporation Kapeldreef 75 B-3001 Leuven Belgium

Ji Soo Kim, Helen Zhu, Reza Sadjadi

Lam Research Corporation 4650 Cushing Parkway Fremont, California 94538

J. Micro/Nanolith. MEMS MOEMS. 8(1), 011007 (January 21, 2009). doi:10.1117/1.3066632
History: Received May 15, 2008; Revised November 02, 2008; Accepted November 24, 2008; Published January 21, 2009
Text Size: A A A

Double-patterning lithography appears a likely candidate to bridge the gap between water-based immersion lithography and EUV. A double-patterning process is discussed for 30-nm half-pitch interconnect structures, using 1.2 numerical aperture immersion lithography combined with the Motif™ critical dimension (CD) shrink technique. An adjusted optical proximity correction (OPC) calculation is required to model the proximity effects of the Motif shrink technique and subsequent metal hard mask (MHM) etch, on top of the lithography-based proximity effects. The litho-etch-litho-etch approach is selected to pattern a TiN metal hard mask. This mask is then used to etch the low-k dielectric. The various process steps and challenges encountered are discussed, with the feasibility of this approach demonstrated by successfully transferring a 30-nm half-pitch pattern into the MHM.

Figures in this Article
© 2009 Society of Photo-Optical Instrumentation Engineers

Citation

Janko Versluijs ; Jean-François De Marneffe ; Danny Goossens ; Tom Vandeweyer ; Vincent Wiaux, et al.
"30-nm half-pitch metal patterning using Motif™ critical dimension shrink technique and double patterning", J. Micro/Nanolith. MEMS MOEMS. 8(1), 011007 (January 21, 2009). ; http://dx.doi.org/10.1117/1.3066632


Tables

Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

PubMed Articles
Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.