Special Section on Double-Patterning Lithography

Combinatorial overlay control for double patterning

[+] Author Affiliations
Christopher P. Ausschnitt, Scott D. Halle

IBM Semiconductor Research and Development Center, Waltham, Massachusetts 02454

J. Micro/Nanolith. MEMS MOEMS. 8(1), 011008 (January 22, 2009). doi:10.1117/1.3023079
History: Received May 27, 2008; Revised August 06, 2008; Accepted August 06, 2008; Published January 22, 2009
Text Size: A A A

The extension of optical lithography to 32nm and beyond is dependent on double-patterning at critical levels. Double patterning adds degrees of freedom for overlay variation while reducing the allowed overlay tolerance. Overlay control requires the assessment and minimization of error among various mask/layer combinations. The possible overlay control combinations scale as Cn=(2n1)2 with the number of reference layers n containing (x,y) alignment and overlay targets. Finding the optimum overlay control pathway requires that we employ the on-product means to examine multiple options compatible with the product overlay tolerances. The Blossom overlay target enables simultaneous determination of all combinations of patterns represented within the measurement tool field of view. We examine Blossom enabled use cases in double patterning overlay control as demonstrated at contact-to-gate registration on a 32nm product.

Figures in this Article
© 2009 Society of Photo-Optical Instrumentation Engineers

Citation

Christopher P. Ausschnitt and Scott D. Halle
"Combinatorial overlay control for double patterning", J. Micro/Nanolith. MEMS MOEMS. 8(1), 011008 (January 22, 2009). ; http://dx.doi.org/10.1117/1.3023079


Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement


 

  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.