Special Section on Theory and Practice of MEMS/NEMS/MOEMS, RF MEMS, and BioMEMS

Etching characteristics and mechanism of vanadium dioxide in inductively coupled Cl2∕Ar plasma

[+] Author Affiliations
Taehoon Lee

Korea University, Department of Control and Instrumentation Engineering, Chungnam, Korea

Alexander Efremov

State University of Chemistry and Technology, Department of Electronic Devices and Materials Technology, Ivanovo, Russia

Yong-Hyun Ham

Korea University, Department of Control and Instrumentation Engineering, Chungnam, Korea

Sun Jin Yun

Electronics and Telecommunications Research Institute, Daejon, Korea

Nam-Ki Min

Korea University, Department of Control and Instrumentation Engineering, Chungnam, Korea

MunPyo Hong

Korea University, Department of Display Semiconductor, Chungnam, Korea

Kwang-Ho Kwon

Korea University, Department of Control and Instrumentation Engineering, Chungnam, Korea

J. Micro/Nanolith. MEMS MOEMS. 8(2), 021110 (April 03, 2009). doi:10.1117/1.3100423
History: Received August 01, 2008; Revised December 04, 2008; Accepted December 08, 2008; Published April 03, 2009
Text Size: A A A

An investigation of a VO2 etch mechanism in Cl2Ar inductively coupled plasma under the condition of low ion bombardment energy is carried out. It is found that an increase in Ar mixing ratio results a nonmonotonic VO2 etch rate, which reaches a maximum of 70to80nmmin at 70 to 75% Ar. The model-based analysis of the etch mechanism shows that the VO2 etch kinetics correspond to the ion-flux-limited etch regime. This is most likely due to the domination of low volatile VCl3 and/or VCl2 in the reaction products.

Figures in this Article
© 2009 Society of Photo-Optical Instrumentation Engineers

Topics

Etching ; Plasmas ; Vanadium

Citation

Taehoon Lee ; Alexander Efremov ; Yong-Hyun Ham ; Sun Jin Yun ; Nam-Ki Min, et al.
"Etching characteristics and mechanism of vanadium dioxide in inductively coupled Cl2∕Ar plasma", J. Micro/Nanolith. MEMS MOEMS. 8(2), 021110 (April 03, 2009). ; http://dx.doi.org/10.1117/1.3100423


Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

PubMed Articles
Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.