Special Section on Theory and Practice of MEMS/NEMS/MOEMS, RF MEMS, and BioMEMS

Novel imprint lithography process used in fabrication of micro/nanostructures in organic photovoltaic devices

[+] Author Affiliations
Hongzhong Liu

Xi’an Jiaotong University, State Key Laboratory for Manufacturing Systems Engineering, 28 Xianning West Road, Xi’an Shaanxi Province 7140049, China

Yucheng Ding, Weitao Jiang, Qin Lian, Lei Yin, Yongsheng Shi, Bingheng Lu

Xi’an Jiaotong University, State Key Laboratory for Manufacturing Systems Engineering, 28 Xianning West Road, Xi’an Shaanxi Province 7140049, China

J. Micro/Nanolith. MEMS MOEMS. 8(2), 021170 (June 08, 2009). doi:10.1117/1.3142966
History: Received August 09, 2008; Revised February 09, 2009; Accepted April 13, 2009; Published June 08, 2009
Text Size: A A A

A novel multistep loading and demolding process in nanoimprint lithography (NIL) with a soft mold is developed to fabricate 3-D micro- or nanoscale cathode structures in polymer photovoltaic (PPV) devices. Experiments show that this new NIL process, called distortion reduction by pressure releasing (DRPR) and two-step curing method for the demolding process, can reduce and avoid the distortions of the imprint mold and wafer stage, and through the two-step curing method, the transformation of resist from liquid to solid state can be controlled, which is helpful to decrease the demolding force and avoid some defects caused by “blind” demolding. With this new NIL process, the main replicating error caused by distortions and blind demolding can be limited effectively, and the micro- or nanoscale cathode structures in PPV devices can be fabricated with high fidelity to the imprint mold, which can improve the power conversion efficiency of PPV.

Figures in this Article
© 2009 Society of Photo-Optical Instrumentation Engineers

Citation

Hongzhong Liu ; Yucheng Ding ; Weitao Jiang ; Qin Lian ; Lei Yin, et al.
"Novel imprint lithography process used in fabrication of micro/nanostructures in organic photovoltaic devices", J. Micro/Nanolith. MEMS MOEMS. 8(2), 021170 (June 08, 2009). ; http://dx.doi.org/10.1117/1.3142966


Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

PubMed Articles
Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.