Novel imprint lithography process used in fabrication of micro/nanostructures in organic photovoltaic devices

Hongzhong Liu; Yucheng Ding; Weitao Jiang; Qin Lian; Lei Yin; Yongsheng Shi; Bingheng Lu

doi:10.1117/1.3142966

1 April 2009 Novel imprint lithography process used in fabrication of micro/nanostructures in organic photovoltaic devices

Hongzhong Liu, Yucheng Ding, Weitao Jiang, Qin Lian, Lei Yin, Yongsheng Shi, Bingheng Lu

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 8, Issue 2, 021170 (April 2009). https://doi.org/10.1117/1.3142966

Abstract

A novel multistep loading and demolding process in nanoimprint lithography (NIL) with a soft mold is developed to fabricate 3-D micro- or nanoscale cathode structures in polymer photovoltaic (PPV) devices. Experiments show that this new NIL process, called distortion reduction by pressure releasing (DRPR) and two-step curing method for the demolding process, can reduce and avoid the distortions of the imprint mold and wafer stage, and through the two-step curing method, the transformation of resist from liquid to solid state can be controlled, which is helpful to decrease the demolding force and avoid some defects caused by "blind" demolding. With this new NIL process, the main replicating error caused by distortions and blind demolding can be limited effectively, and the micro- or nanoscale cathode structures in PPV devices can be fabricated with high fidelity to the imprint mold, which can improve the power conversion efficiency of PPV.

©(2009) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Hongzhong Liu, Yucheng Ding, Weitao Jiang, Qin Lian, Lei Yin, Yongsheng Shi, and Bingheng Lu "Novel imprint lithography process used in fabrication of micro/nanostructures in organic photovoltaic devices," Journal of Micro/Nanolithography, MEMS, and MOEMS 8(2), 021170 (1 April 2009). https://doi.org/10.1117/1.3142966

Published: 1 April 2009

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