Special Section on Extreme-Ultraviolet Interference Lithography

Design considerations for a cascaded grating interferometer suitable for extreme ultraviolet interference lithography

[+] Author Affiliations
Zachary H. Levine

National Institute for Standards and Technology, 100 Bureau Drive, Stop 8410, Gaithersburg, Maryland 20899-8410

Steven Grantham

National Institute for Standards and Technology, 100 Bureau Drive, Stop 8410, Gaithersburg, Maryland 20899-8410

Thomas B. Lucatorto

National Institute for Standards and Technology, 100 Bureau Drive, Stop 8410, Gaithersburg, Maryland 20899-8410

J. Micro/Nanolith. MEMS MOEMS. 8(2), 021202 (April 10, 2009). doi:10.1117/1.3112008
History: Received September 29, 2008; Revised November 19, 2008; Accepted November 24, 2008; Published April 10, 2009
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Recently, extreme ultraviolet interference lithography using a single grating interferometer and a highly coherent synchrotron insertion device source has proven to be an extremely useful technique for producing patterns with feature sizes in the range of 10nm. The high demand for these nanoscale patterns and the small number of suitable highly coherent extreme ultraviolet sources has created new interest in the cascaded grating interferometer because of its relaxed demands for spatial and temporal coherence. This work extends that of earlier researchers on such systems by providing a compact algebraic analysis of the effects on fringe contrast of source divergence, spectral bandpass, lack of parallelism of the grating rulings, grating period mismatch, defocus, and wavefront curvature. The results are applied to illustrate the feasibility of implementing the interferometer on a small bending magnet synchrotron source, but the analysis should be applicable to typical portable plasma sources as well.

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© 2009 Society of Photo-Optical Instrumentation Engineers

Citation

Zachary H. Levine ; Steven Grantham and Thomas B. Lucatorto
"Design considerations for a cascaded grating interferometer suitable for extreme ultraviolet interference lithography", J. Micro/Nanolith. MEMS MOEMS. 8(2), 021202 (April 10, 2009). ; http://dx.doi.org/10.1117/1.3112008


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