Special Section on Extreme-Ultraviolet Interference Lithography

New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers

[+] Author Affiliations
Przemyslaw W. Wachulak

Colorado State University, NSF ERC for Extreme Ultraviolet Science & Technology, Department of Electrical and Computer Engineering, Fort Collins, Colorado 80523

Lukasz Urbanski

Colorado State University, NSF ERC for Extreme Ultraviolet Science & Technology, Department of Electrical and Computer Engineering, Fort Collins, Colorado 80523

Maria G. Capeluto

Universidad de Buenos Aires, Departmento de Fisica, Facultad de Ciencias Exactas y Naturales, Buenos Aires, Argentina

David Hill

Morehouse College, Department of Physics, Atlanta, Georgia 30314

Willie S. Rockward

Morehouse College, Department of Physics, Atlanta, Georgia 30314

Claudio Iemmi

Universidad de Buenos Aires, Departmento de Fisica, Facultad de Ciencias Exactas y Naturales, Buenos Aires, Argentina

Erik H. Anderson

Lawrence Berkeley National Laboratory, Berkeley, California

Carmen S. Menoni

Colorado State University, NSF ERC for Extreme Ultraviolet Science & Technology, Department of Electrical and Computer Engineering, Fort Collins, Colorado 80523

Jorge J. Rocca

Colorado State University, NSF ERC for Extreme Ultraviolet Science & Technology, Department of Electrical and Computer Engineering, Fort Collins, Colorado 80523

Mario C. Marconi

Colorado State University, NSF ERC for Extreme Ultraviolet Science & Technology, Department of Electrical and Computer Engineering, Fort Collins, Colorado 80523

J. Micro/Nanolith. MEMS MOEMS. 8(2), 021206 (May 06, 2009). doi:10.1117/1.3129837
History: Received September 27, 2008; Revised March 06, 2009; Accepted March 25, 2009; Published May 06, 2009
Text Size: A A A

The development of tabletop extreme ultraviolet (EUV) lasers opens now the possibility to realize interferometric lithography systems at EUV wavelengths that easily fit on the top of an optical table. The high degree of spatial and temporal coherence and high brightness of the compact EUV laser sources make them a good option for interferometric applications. The combination of these novel sources with interferometric lithography setups brings to the laboratory environment capabilities that so far had been restricted exclusively to large synchrotron facilities.

Figures in this Article
© 2009 Society of Photo-Optical Instrumentation Engineers

Citation

Przemyslaw W. Wachulak ; Lukasz Urbanski ; Maria G. Capeluto ; David Hill ; Willie S. Rockward, et al.
"New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers", J. Micro/Nanolith. MEMS MOEMS. 8(2), 021206 (May 06, 2009). ; http://dx.doi.org/10.1117/1.3129837


Tables

Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement


 

  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.