Special Section on Computational Lithography

Orientation Zernike polynomials: a useful way to describe the polarization effects of optical imaging systems

[+] Author Affiliations
Johannes Ruoff

Carl Zeiss SMT AG, 73447 Oberkochen, Germany

Michael Totzeck

Carl Zeiss AG, 73446 Oberkochen, Germany

J. Micro/Nanolith. MEMS MOEMS. 8(3), 031404 (August 05, 2009). doi:10.1117/1.3173803
History: Received December 11, 2008; Revised April 03, 2009; Accepted April 15, 2009; Published August 05, 2009
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We introduce the new concept of orientation Zernike polynomials, a base function representation of retardation and diattenuation in close analogy to the wavefront description by scalar Zernike polynomials. We show that the orientation Zernike polynomials provide a complete and systematic description of vector imaging using high numerical aperture lithography lenses and, hence, a basis for an in depth understanding of both polarized and unpolarized imaging, and its modeling.

© 2009 Society of Photo-Optical Instrumentation Engineers

Citation

Johannes Ruoff and Michael Totzeck
"Orientation Zernike polynomials: a useful way to describe the polarization effects of optical imaging systems", J. Micro/Nanolith. MEMS MOEMS. 8(3), 031404 (August 05, 2009). ; http://dx.doi.org/10.1117/1.3173803


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