Articles

Hotspot management and its applications in ultralow k1 lithography

[+] Author Affiliations
Kohji Hashimoto

Toshiba Corporation, Semiconductor Company, Process and Manufacturing Engineering Center, 8, Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan

Satoshi Usui

Toshiba Corporation, Semiconductor Company, Process and Manufacturing Engineering Center, 3500 Oaza-Matsuoka, Oita 870-0125, Japan

Shigeki Nojima, Toshiya Kotani

Toshiba Corporation, Semiconductor Company, Process and Manufacturing Engineering Center, 8, Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan

Eiji Yamanaka

Toshiba Corporation, Semiconductor Company, Process and Manufacturing Engineering Center, 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-0001, Japan

Satoshi Tanaka, Soichi Inoue

Toshiba Corporation, Semiconductor Company, Process and Manufacturing Engineering Center, 8, Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan

J. Micro/Nanolith. MEMS MOEMS. 8(3), 033007 (September 21, 2009). doi:10.1117/1.3213232
History: Received August 19, 2008; Revised June 03, 2009; Accepted July 16, 2009; Published September 21, 2009
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We have constructed a hotspot management flow and applied the flow to large-scale integration (LSI) manufacturing in the ultralow k1 lithography era. This flow involves three main management steps: hotspot reduction, hotspot extraction, and hotspot monitoring. Hotspot reduction works with lithography-friendly restricted design rule (RDR) and manufacturability check (MC). Hotspot extraction is carried out with a view to realizing short operation time and accurate extraction. Hotspot monitoring is achieved with tolerance-based verification in the mask fabrication process and wafer process (lithography and etching). These technology elements could be integrated into the LSI fabrication flow for reduction of total cost, quick turnaround time (TAT), and ramp-up to volume production. In addition to discussion of the technology elements in hotspot management, we also provide typical applications for important decisions in LSI fabrication: photomask availability for any exposure tools (“exposure tool yokoten”) and process condition updates in LSI fabrication.

© 2009 Society of Photo-Optical Instrumentation Engineers

Citation

Kohji Hashimoto ; Satoshi Usui ; Shigeki Nojima ; Toshiya Kotani ; Eiji Yamanaka, et al.
"Hotspot management and its applications in ultralow k1 lithography", J. Micro/Nanolith. MEMS MOEMS. 8(3), 033007 (September 21, 2009). ; http://dx.doi.org/10.1117/1.3213232


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