Articles

Patterning of multilayer dielectric optical filters using metal masks fabricated by electroforming and photolithography

[+] Author Affiliations
Cheng-Chung Jaing

Minghsin University of Science and Technology, Department of Optoelectronic System Engineering and Department of Electronic Engineering, Hsin-Chu 304, Taiwan

Chii-Rong Yang

National Taiwan Normal University, Department of Mechatronic Technology, Taipei 106, Taiwan

Chun-Ming Chang

National Taiwan Normal University, Department of Mechatronic Technology, Taipei 106, Taiwan and Instrument Technology Research Center, Hsin-Chu 300, Taiwan

Chao-Te Lee

Instrument Technology Research Center, Hsin-Chu 300, Taiwan

Chien-Nan Hsiao

Instrument Technology Research Center, Hsin-Chu 300, Taiwan

J. Micro/Nanolith. MEMS MOEMS. 8(3), 033009 (September 10, 2009). doi:10.1117/1.3222910
History: Received February 27, 2009; Revised July 03, 2009; Accepted July 22, 2009; Published September 10, 2009
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Ni films, replacing photoresists, serve as masks in the selective deposition of optical thin films by electron-beam gun evaporation at a substrate temperature of 300°C. Photolithography is adopted herein to define the growth of Ni films by electroforming. Mosaic patterns with a width of 20μm are employed as red color filters, which are longwave pass. These red filters are formed from alternate SiO2 and TiO2 layers and have a mean transmittance of >90%. The experimental results show that the combined use of photolithography, electroforming, and electron-beam gun evaporation can deposit miniaturized multilayer dielectric coatings with high light transmittance in a hot process.

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© 2009 Society of Photo-Optical Instrumentation Engineers

Citation

Cheng-Chung Jaing ; Chii-Rong Yang ; Chun-Ming Chang ; Chao-Te Lee and Chien-Nan Hsiao
"Patterning of multilayer dielectric optical filters using metal masks fabricated by electroforming and photolithography", J. Micro/Nanolith. MEMS MOEMS. 8(3), 033009 (September 10, 2009). ; http://dx.doi.org/10.1117/1.3222910


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