Ni films, replacing photoresists, serve as masks in the selective deposition of optical thin films by electron-beam gun evaporation at a substrate temperature of . Photolithography is adopted herein to define the growth of Ni films by electroforming. Mosaic patterns with a width of are employed as red color filters, which are longwave pass. These red filters are formed from alternate and layers and have a mean transmittance of . The experimental results show that the combined use of photolithography, electroforming, and electron-beam gun evaporation can deposit miniaturized multilayer dielectric coatings with high light transmittance in a hot process.