The effect of residual stress on the nanoindentation property of multilayers has been investigated. Sandwiched multilayers were deposited on Si(100) substrates by means of ultrahigh-vacuum ion-beam sputtering at room temperature (RT). Four structures with different Si top-layer thickness of 5, 10, 25, and and the constant thickness of underlayer at were investigated in this study. The residual stress of the ( thick) film was about under compression, and its hardness was at RT. The compressive residual stress was decreased to with the increased thickness of Si toplayer up to , and its hardness was reduced to at RT. The effect of Si top-layer thickness on residual stress on the nanoindentation property were also discussed. The results showed that the thicker was the Si toplayer, the lower was the residual stress and hardness, which was good for the suppression of the buckling or wrinkling in the -nanocomposite film.