Special Section on Extreme-Ultraviolet Lithography

Performance results of laser-produced plasma test and prototype light sources for EUV lithography

[+] Author Affiliations
Norbert R. Böwering

Cymer, Inc., 17075 Thornmint Court, San Diego, California 92127

Igor V. Fomenkov

Cymer, Inc., 17075 Thornmint Court, San Diego, California 92127

David C. Brandt, Alex I. Ershov, David W. Myers, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, David A. Vidusek, Richard R. Hou

Cymer, Inc., 17075 Thornmint Court, San Diego, California 92127

Alexander N. Bykanov

Cymer, Inc., 17075 Thornmint Court, San Diego, California 92127

William N. Partlo

Cymer, Inc., 17075 Thornmint Court, San Diego, California 92127

Nigel R. Farrar

Cymer, Inc., 17075 Thornmint Court, San Diego, California 92127

Georgiy O. Vaschenko

Cymer, Inc., 17075 Thornmint Court, San Diego, California 92127

Oleh V. Khodykin

Cymer, Inc., 17075 Thornmint Court, San Diego, California 92127

Jerzy R. Hoffman

Cymer, Inc., 17075 Thornmint Court, San Diego, California 92127

Christopher P. Chrobak

Cymer, Inc., 17075 Thornmint Court, San Diego, California 92127

Shailendra N. Srivastava

Cymer, Inc., 17075 Thornmint Court, San Diego, California 92127

Silvia De Dea

Cymer, Inc., 17075 Thornmint Court, San Diego, California 92127

J. Micro/Nanolith. MEMS MOEMS. 8(4), 041504 (October 05, 2009). doi:10.1117/1.3224942
History: Received March 09, 2009; Revised May 29, 2009; Accepted June 02, 2009; Published October 05, 2009
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Improved performance and specific results are reported for several test and prototype extreme ultraviolet (EUV) light sources developed for next-generation lithography. High repetition rate and high-power CO2 laser-produced plasma sources operating on tin droplet targets are described. Details of laser architecture, source chambers and system operation are given. Stable output power, efficient light collection, and clean EUV transmission could be achieved for hours of operation. We review progress during integration of light sources with collector mirrors reaching EUV power levels at intermediate focus of 60W and 45W, respectively, with duty cycles of 25% and 40%. Far-field EUV images of the collected light were recorded to monitor the source output performance during extended tests of collector longevity and debris protection with system operation time exceeding 50h. Development results on EUV spectra, out-of-band (OOB) radiation, and ion debris obtained with dedicated metrology setups are also described. Angle-resolved measurements with ion energy analyzer and Faraday cups reveal the contributions of individual ion charge states in related spectra. Our laser-produced EUV light source technology has now reached a level of maturity in full integration where prototype sources can be delivered and pilot line introduction can be prepared.

© 2009 Society of Photo-Optical Instrumentation Engineers

Citation

Norbert R. Böwering ; Igor V. Fomenkov ; David C. Brandt ; Alexander N. Bykanov ; Alex I. Ershov, et al.
"Performance results of laser-produced plasma test and prototype light sources for EUV lithography", J. Micro/Nanolith. MEMS MOEMS. 8(4), 041504 (October 05, 2009). ; http://dx.doi.org/10.1117/1.3224942


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