Special Section on Extreme-Ultraviolet Lithography

Development progress of optics for extreme ultraviolet lithography at Nikon

[+] Author Affiliations
Katsuhiko Murakami

Nikon Corporation, 1-10-1, Asamizodai, Sagamihara, Kanagawa 228-0828 Japan

Tetsuya Oshino

Nikon Corporation, 1-10-1, Asamizodai, Sagamihara, Kanagawa 228-0828 Japan

Hiroyuki Kondo

Nikon Corporation, 1-10-1, Asamizodai, Sagamihara, Kanagawa 228-0828 Japan

Masayuki Shiraishi

Nikon Corporation, 1-10-1, Asamizodai, Sagamihara, Kanagawa 228-0828 Japan

Hiroshi Chiba

Nikon Corporation, 1-10-1, Asamizodai, Sagamihara, Kanagawa 228-0828 Japan

Hideki Komatsuda

Nikon Corporation, 1-10-1, Asamizodai, Sagamihara, Kanagawa 228-0828 Japan

Kazushi Nomura

Nikon Corporation, 1-10-1, Asamizodai, Sagamihara, Kanagawa 228-0828 Japan

Jin Nishikawa

Nikon Corporation, 1-10-1, Asamizodai, Sagamihara, Kanagawa 228-0828 Japan

J. Micro/Nanolith. MEMS MOEMS. 8(4), 041507 (October 05, 2009). doi:10.1117/1.3238522
History: Received March 07, 2009; Revised July 03, 2009; Accepted July 08, 2009; Published October 05, 2009
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The full-field extreme ultraviolet (EUV) exposure tool named EUV1 is integrated and exposure experiments are started with a numerical aperture of the projection optics of 0.25, and conventional partial coherent illumination with a coherence factor of 0.8. 32-nm elbow patterns are resolved in a full arc field in static exposure. In a central area, 25-nm line-and-space patterns are resolved. In scanning exposure, 32-nm line-and-space patterns are successfully exposed on a full wafer. Wavefront error of the projection optics is improved to 0.4-nm rms. Flare impact on imaging is clarified, dependent on flare evaluation using the Kirk test. Resolution enhancement technology (RET) fly-eye mirrors and reflection-type spectral purity filters (SPFs) are investigated to increase throughput. High-NA projection optics design is also reviewed.

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© 2009 Society of Photo-Optical Instrumentation Engineers

Citation

Katsuhiko Murakami ; Tetsuya Oshino ; Hiroyuki Kondo ; Masayuki Shiraishi ; Hiroshi Chiba, et al.
"Development progress of optics for extreme ultraviolet lithography at Nikon", J. Micro/Nanolith. MEMS MOEMS. 8(4), 041507 (October 05, 2009). ; http://dx.doi.org/10.1117/1.3238522


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