Articles

Residual speckle in a lithographic illumination system

[+] Author Affiliations
Gregg M. Gallatin

Applied Math Solutions, LLC, 6 Castle Lane, Newtown, Connecticut 06470

Naonori Kita

Nikon Corporation, Development Headquarters, Optical Design Department, Strategic Technology Development Section, 201-9 Miizugahara, Kumagaya, Saitama 360-8559, Japan

Tomoko Ujike

Nikon Corporation, Research and Development Headquarters, Core Technology Center, Optical Research Laboratory, 4th Development Section, 201-9 Miizugahara, Kumagaya, Saitama 360-8559, Japan

Bill Partlo

Cymer Incorporated, 17075 Thornmint Court, San Diego, California 92127

J. Micro/Nanolith. MEMS MOEMS. 8(4), 043003 (November 25, 2009). doi:10.1117/1.3256007
History: Received April 06, 2009; Revised August 26, 2009; Accepted September 13, 2009; Published November 25, 2009; Online November 25, 2009
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Finite bandwidth and finite exposure time place a fundamental limit on dose uniformity. We evaluate the amplitude and spatial distribution of this residual speckle in a given type of lithographic illumination system. For nominal bandwidths and exposure times, the level of dose nonuniformity is on the order of several percent. We argue that this effect actually makes only a small contribution to line edge roughness.

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© 2009 Society of Photo-Optical Instrumentation Engineers

Citation

Gregg M. Gallatin ; Naonori Kita ; Tomoko Ujike and Bill Partlo
"Residual speckle in a lithographic illumination system", J. Micro/Nanolith. MEMS MOEMS. 8(4), 043003 (November 25, 2009). ; http://dx.doi.org/10.1117/1.3256007


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