Articles

Fluorinated polymethacrylates as highly sensitive nonchemically amplified e-beam resists

[+] Author Affiliations
Jeffrey R. Strahan

The University of Texas at Austin, Department of Chemistry, 1 University Station A5300, Austin, Texas 78712

Jacob R. Adams

The University of Texas at Austin, Department of Chemistry, 1 University Station A5300, Austin, Texas 78712 and IMEC, Kapeldreef 75, Leuven 3001, Belgium

Wei-Lun Jen

The University of Texas at Austin, Department of Chemistry, 1 University Station A5300, Austin, Texas 78712

Anja Vanleenhove

NXP Semiconductors, Kapeldreef 75, Leuven 3001, Belgium

Colin C. Neikirk, Timothy Rochelle

The University of Texas at Austin, Department of Chemistry, 1 University Station A5300, Austin, Texas 78712

Roel Gronheid

IMEC, Kapeldreef 75, Leuven 3001, Belgium

C. Grant Willson

The University of Texas at Austin, Department of Chemistry, 1 University Station A5300, Austin, Texas 78712

J. Micro/Nanolith. MEMS MOEMS. 8(4), 043011 (December 30, 2009). doi:10.1117/1.3274005
History: Received March 23, 2009; Revised July 14, 2009; Accepted October 23, 2009; Published December 30, 2009; Online December 30, 2009
Text Size: A A A

In an effort to improve on the sensitivity of commercial nonchemically amplified e-beam resists, four polyacrylates functionalized with α-CF3 and/or CH2CF3 alkoxy substituents were studied. The α-CF3 substituent is known to increase backbone-scission efficiency while simultaneously eliminating acidic outgassing and cross-linking known to occur in α-halogen substituted polyacrylates. Contrast curves for the polymeric α-CF3 acrylates, generated through e-beam exposure, showed that the resists required an order of magnitude less dose than the current industry standards, poly(methyl methacrylate) (PMMA) and ZEP. The fundamental sensitivity of these materials to backbone scissioning was determined via Co60γ-ray irradiation. The chain scissioning, G(s), and cross-linking, G(x), values calculated from the resulting change in molecular weight demonstrated that all fluorinated resists possess higher G(s) values than either PMMA or ZEP and have no detectable G(x) values. Utilizing e-beam and EUV interference lithographies, the photospeed of poly(methyl α-trifluoromethacrylate) (PMTFMA) was found to be 2.8× and 4.0× faster, respectively, than PMMA.

Figures in this Article
© 2009 Society of Photo-Optical Instrumentation Engineers

Citation

Jeffrey R. Strahan ; Jacob R. Adams ; Wei-Lun Jen ; Anja Vanleenhove ; Colin C. Neikirk, et al.
"Fluorinated polymethacrylates as highly sensitive nonchemically amplified e-beam resists", J. Micro/Nanolith. MEMS MOEMS. 8(4), 043011 (December 30, 2009). ; http://dx.doi.org/10.1117/1.3274005


Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement


 

  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.