Articles

Single-component molecular resists containing bound photoacid generator functionality

[+] Author Affiliations
Richard A. Lawson

Georgia Institute of Technology, School of Chemical and Biomolecular Engineering, Atlanta, Georgia 30332-0100

Laren M. Tolbert

Georgia Institute of Technology, School of Chemistry and Biochemistry, Atlanta, Georgia 30332

Clifford L. Henderson

Georgia Institute of Technology, School of Chemical and Biomolecular Engineering, Atlanta, Georgia 30332-0100

J. Micro/Nanolith. MEMS MOEMS. 9(1), 013015 (February 09, 2010). doi:10.1117/1.3280258
History: Received April 29, 2009; Revised October 26, 2009; Accepted November 09, 2009; Published February 09, 2010; Online February 09, 2010
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A series of single-component molecular resists was designed, synthesized, characterized, and patterned using 100-keV e-beam lithography. An onium salt photoacid generator-based single-component resist system (referred to here as TAS) that creates a free photoacid upon exposure is shown to produce a low line edge roughness (LER) of 3.9nm(3σ) but was limited in resolution due to photoacid diffusion. A different single-component molecular resist (referred to here as NBB) with a covalently bound nonionic photoacid generator, i.e., one in which the photoacid anion is bound to the resist core, was also synthesized. NBB was found to exhibit an improved resolution of 40nm due to reduced photoacid diffusion while maintaining a good LER and line width roughness (LWR) of 3.9nm and 5.6nm, respectively. Despite the small size of NBB, it was found to exhibit a glass transition temperature of 82°C. It also showed good adhesion, formed high-quality films, and showed no dark erosion during development. These compounds demonstrate that it is possible to form single-component molecular resists using both ionic and nonionic photoacid generators and that such small molecule resists can provide all the basic requirements to serve as functional chemically amplified resists.

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© 2010 Society of Photo-Optical Instrumentation Engineers

Citation

Richard A. Lawson ; Laren M. Tolbert and Clifford L. Henderson
"Single-component molecular resists containing bound photoacid generator functionality", J. Micro/Nanolith. MEMS MOEMS. 9(1), 013015 (February 09, 2010). ; http://dx.doi.org/10.1117/1.3280258


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