Errata

Errata: Extreme ultraviolet lithography's path to manufacturing

[+] Author Affiliations
Harry J. Levinson

GLOBALFOUNDRIES, 1050 Arques Avenue, Sunnyvale, California 94085

J. Micro/Nanolith. MEMS MOEMS. 9(1), 019802 (March 04, 2010). doi:10.1117/1.3322187
History: Published March 04, 2010; Online March 04, 2010
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This article [J. Micro/Nanolith. MEMS MOEMS8, 041501 (2009)] was originally published online on 22 December 2009 with an error on page 4, Fig. 4. The correct figure and caption are printed below.

Graphic Jump LocationF4 :

Exposure tool list prices over time (in US dollars). The open circles are historical data from Sematech,30 while the solid line is an exponential least-squares fit to the Sematech data. The costs for the EUV tool are from Wüest, Hazelton, and Hughes.31

All online versions of the article were corrected on 29 January 2010.

© 2010 Society of Photo-Optical Instrumentation Engineers

Citation

Harry J. Levinson
"Errata: Extreme ultraviolet lithography's path to manufacturing", J. Micro/Nanolith. MEMS MOEMS. 9(1), 019802 (March 04, 2010). ; http://dx.doi.org/10.1117/1.3322187


Figures

Graphic Jump LocationF4 :

Exposure tool list prices over time (in US dollars). The open circles are historical data from Sematech,30 while the solid line is an exponential least-squares fit to the Sematech data. The costs for the EUV tool are from Wüest, Hazelton, and Hughes.31

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