Articles

Micropore and nanopore fabrication in hollow antiresonant reflecting optical waveguides

[+] Author Affiliations
Matthew R. Holmes, Tao Shang, Aaron R. Hawkins

Brigham Young University, Electrical and Computer Engineering Department, 459 Clyde Building, Provo, Utah 84602

Mikhail Rudenko, Philip Measor, Holger Schmidt

University of California Santa Cruz, School of Engineering, 1156 High Street, Santa Cruz, California 95064

J. Micro/Nanolith. MEMS MOEMS. 9(2), 023004 (April 02, 2010). doi:10.1117/1.3378152
History: Received September 22, 2009; Revised February 16, 2010; Accepted February 22, 2010; Published April 02, 2010; Online April 02, 2010
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We demonstrate the fabrication of micropore and nanopore features in hollow antiresonant reflecting optical waveguides to create an electrical and optical analysis platform that can size select and detect a single nanoparticle. Micropores (4μm diameter) are reactive-ion etched through the top SiO2 and SiN layers of the waveguides, leaving a thin SiN membrane above the hollow core. Nanopores are formed in the SiN membranes using a focused ion-beam etch process that provides control over the pore size. Openings as small as 20nm in diameter are created. Optical loss measurements indicate that micropores did not significantly alter the loss along the waveguide.

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© 2010 Society of Photo-Optical Instrumentation Engineers

Citation

Matthew R. Holmes ; Tao Shang ; Aaron R. Hawkins ; Mikhail Rudenko ; Philip Measor, et al.
"Micropore and nanopore fabrication in hollow antiresonant reflecting optical waveguides", J. Micro/Nanolith. MEMS MOEMS. 9(2), 023004 (April 02, 2010). ; http://dx.doi.org/10.1117/1.3378152


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