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Single-exposure maskless plasmonic lithography for patterning of periodic nanoscale grating features

[+] Author Affiliations
Kandammathe Valiyaveedu Sreekanth, Vadakke Matham Murukeshan

Nanyang Technological University, School of Mechanical and Aerospace Engineering, Singapore 639798

J. Micro/Nanolith. MEMS MOEMS. 9(2), 023007 (April 16, 2010). doi:10.1117/1.3386680
History: Received September 17, 2009; Revised February 18, 2010; Accepted March 03, 2010; Published April 16, 2010; Online April 16, 2010
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A lithography technique for patterning one-dimensional (1-D) nanoscale grating features based on surface plasmon (SP) interference is demonstrated both experimentally and numerically. We report a cost-effective, single-exposure maskless plasmonic lithography to generate 156-nm periodic grating lines at an exposure wavelength of 364nm.

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© 2010 Society of Photo-Optical Instrumentation Engineers

Citation

Kandammathe Valiyaveedu Sreekanth and Vadakke Matham Murukeshan
"Single-exposure maskless plasmonic lithography for patterning of periodic nanoscale grating features", J. Micro/Nanolith. MEMS MOEMS. 9(2), 023007 (April 16, 2010). ; http://dx.doi.org/10.1117/1.3386680


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