Articles

Nebulous hotspot and algorithm variability in computation lithography

[+] Author Affiliations
Edmund Y. Lam

The University of Hong Kong, Department of Electrical and Electronic Engineering, Imaging Systems Laboratory, Pokfulam Road, Hong Kong

Alfred K. Wong

P.O. Box 1342, Boston, Massachusetts 02113

J. Micro/Nanolith. MEMS MOEMS. 9(3), 033002 (July 14, 2010). doi:10.1117/1.3459937
History: Received June 11, 2009; Revised May 09, 2010; Accepted May 21, 2010; Published July 14, 2010; Online July 14, 2010
Text Size: A A A

Computation lithography relies on algorithms. However, these algorithms exhibit variability that can be as much as 5% (one standard deviation) of the critical dimension for the 65-nm technology. Using hotspot analysis and fixing as an example, we argue that such variability can be addressed on the algorithm level via controlling and eliminating its root causes, and on the application level by setting specifications that are commensurate with both the limitations of the algorithms and the goals of the application.

Figures in this Article
© 2010 Society of Photo-Optical Instrumentation Engineers

Citation

Edmund Y. Lam and Alfred K. Wong
"Nebulous hotspot and algorithm variability in computation lithography", J. Micro/Nanolith. MEMS MOEMS. 9(3), 033002 (July 14, 2010). ; http://dx.doi.org/10.1117/1.3459937


Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

PubMed Articles
Surface reconstruction from microscopic images in optical lithography. IEEE Trans Image Process 2014;23(8):3560-73.
Advertisement


 

  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.