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Focused ion beam–based nanoimprint stamp for replicating micro/nanostructures under low temperature

[+] Author Affiliations
Hongwen Sun

Hohai University, College of Computer and Information, 200 Jinling Road North, Changzhou, China 213022

Liu Guogao, Shanming Lin

Hohai University, College of Computer and Information, 200 Jinling Road North, Changzhou, China 213022

Jingquan Liu, Di Chen

Shanghai Jiao Tong University, National Key Laboratory of Micro/Nano Fabrication Technology, Research Institute of Micro/Nano Science and Technology, 800 Dongchuan Road, Shanghai, China 200240

J. Micro/Nanolith. MEMS MOEMS. 9(3), 033005 (July 28, 2010). doi:10.1117/1.3469818
History: Received September 18, 2009; Revised April 14, 2010; Accepted June 16, 2010; Published July 28, 2010; Online July 28, 2010
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Focused ion beam (FIB) was employed to fabricate nanoimprint lithography stamps. Complex micro/nanopatterns were fabricated in the stamp, including curved nanograting structures. These micro/nanostructures were then replicated to SU-8 2000.1 resist, with an imprint temperature of 95°C, which is lower than for conventional imprint polymers. Atomic force microscopy was used to characterize the surface profiles of stamp and replica’s and the replication fidelity as well. The results show that nanoimprint with the FIB fabricated stamp can successfully replicate complex micro/nanostructures under low temperature in SU-8.

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© 2010 Society of Photo-Optical Instrumentation Engineers

Citation

Hongwen Sun ; Liu Guogao ; Shanming Lin ; Jingquan Liu and Di Chen
"Focused ion beam–based nanoimprint stamp for replicating micro/nanostructures under low temperature", J. Micro/Nanolith. MEMS MOEMS. 9(3), 033005 (July 28, 2010). ; http://dx.doi.org/10.1117/1.3469818


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