Focused ion beam (FIB) was employed to fabricate nanoimprint lithography stamps. Complex micro/nanopatterns were fabricated in the stamp, including curved nanograting structures. These micro/nanostructures were then replicated to SU-8 2000.1 resist, with an imprint temperature of , which is lower than for conventional imprint polymers. Atomic force microscopy was used to characterize the surface profiles of stamp and replica’s and the replication fidelity as well. The results show that nanoimprint with the FIB fabricated stamp can successfully replicate complex micro/nanostructures under low temperature in SU-8.