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Plant-based resist materials for ultraviolet curing nanoimprint lithography

[+] Author Affiliations
Satoshi Takei

Toyama Prefectural University, Imizu, Toyama 939-0398, Japan and The University of Texas, Austin, Texas 78712-1167 and Osaka University, Toyonaka, Osaka 560-8531, Japan

J. Micro/Nanolith. MEMS MOEMS. 9(3), 033006 (August 06, 2010). doi:10.1117/1.3475951
History: Received March 01, 2010; Revised June 18, 2010; Accepted June 23, 2010; Published August 06, 2010; Online August 06, 2010
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Plant-based resist materials with liquid trehalose derivatives are investigated to achieve low volumetric shrinkage in ultraviolet curing nanoimprint lithography. This procedure is proven to be suitable for resist material design in the process conditions of ultraviolet curing nanoimprint lithography. The developed plant-based resist material using liquid trehalose derivatives with epoxy groups produces high-quality imprint images of 65-nm line and space. The distinctive bulky glucose structure in trehalose derivatives is considered to be effective for minimizing volumetric shrinkage of resist film during ultraviolet polymerization.

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© 2010 Society of Photo-Optical Instrumentation Engineers

Citation

Satoshi Takei
"Plant-based resist materials for ultraviolet curing nanoimprint lithography", J. Micro/Nanolith. MEMS MOEMS. 9(3), 033006 (August 06, 2010). ; http://dx.doi.org/10.1117/1.3475951


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