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Novel fabrication method of corrugated long-period fiber gratings by thick SU-8 photoresist and wet-etching technique

[+] Author Affiliations
Chia-Chin Chiang

National Kaohsiung University of Applied Sciences, Department of Mechanical Engineering, Kaohsiung 807, Taiwan

Hao-Jhen Chang

National Kaohsiung University of Applied Sciences, Department of Mechanical Engineering, Kaohsiung 807, Taiwan

Jin-Shun Kuo

National Kaohsiung University of Applied Sciences, Department of Mechanical Engineering, Kaohsiung 807, Taiwan

J. Micro/Nanolith. MEMS MOEMS. 9(3), 033007 (August 09, 2010). doi:10.1117/1.3478238
History: Received March 01, 2010; Revised July 01, 2010; Accepted July 06, 2010; Published August 09, 2010; Online August 09, 2010
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A novel fabrication method for corrugated long-period fiber gratings (CLPFG) is presented in this study. The patterned SU-8 photoresist is used as a double-side stopper layer for a wet-etching process to fabricate the CLPFG. Presented in this research are four types of CLPFG with periods of 660, 670, 680, and 690μm and resonant wavelengths of 1531, 1539, 1550, and 1558nm, respectively. The maximum resonance loss of the CLPFG with a 680-μm period is 23dB. The CLPFG fabricated in this study is demonstrated for temperature sensing, and the results illustrate that the fabricated CLPFG with a 680-μm period has a temperature sensitivity of 58.4pm°C, a wavelength-shifting linearity of R2=0.994, and a 0.856°C resolution.

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© 2010 Society of Photo-Optical Instrumentation Engineers

Citation

Chia-Chin Chiang ; Hao-Jhen Chang and Jin-Shun Kuo
"Novel fabrication method of corrugated long-period fiber gratings by thick SU-8 photoresist and wet-etching technique", J. Micro/Nanolith. MEMS MOEMS. 9(3), 033007 (August 09, 2010). ; http://dx.doi.org/10.1117/1.3478238


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