Special Section on Reliability, Packaging, Testing, and Characterization of MEMS and MOEMS II

Characterization of dry etching of TiO2/SiO2 distributed Bragg reflectors for tunable optical sensor arrays

[+] Author Affiliations
Onny Setyawati

University of Kassel, Institute of Nanostructure Technologies and Analytics, Heinrich-Plett-Strasse 40, D-34132 Kassel, Germany and Opsolution Nanophotonics GmbH, Goethestrasse 25, D-34119 Kassel, Germany

Markus Engenhorst

University of Kassel, Institute of Nanostructure Technologies and Analytics, Heinrich-Plett-Strasse 40, D-34132 Kassel, Germany

Martin Bartels, Vadim Daneker, Stefan Wittzack

University of Kassel, Institute of Nanostructure Technologies and Analytics, Heinrich-Plett-Strasse 40, D-34132 Kassel, Germany

Tatjana Woit

University of Kassel, Institute of Nanostructure Technologies and Analytics, Heinrich-Plett-Strasse 40, D-34132 Kassel, Germany and Opsolution Nanophotonics GmbH, Goethestrasse 25, D-34119 Kassel, Germany

Florestan Köhler

University of Kassel, Institute of Nanostructure Technologies and Analytics, Heinrich-Plett-Strasse 40, D-34132 Kassel, Germany

Harmut Hillmer

University of Kassel, Institute of Nanostructure Technologies and Analytics, Heinrich-Plett-Strasse 40, D-34132 Kassel, Germany

J. Micro/Nanolith. MEMS MOEMS. 9(4), 041110 (December 28, 2010). doi:10.1117/1.3524828
History: Received April 01, 2010; Revised September 25, 2010; Accepted October 14, 2010; Published December 28, 2010; Online December 28, 2010
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We present the characterization of a dry-etching process for high-contrast TiO2/SiO2 distributed Bragg reflectors, by inductively coupled plasma reactive ion etching, focusing on the etch rate and the etch selectivity. Photoresists and metals as etch masks were investigated. An excellent etch profile using an indium tin oxide mask was obtained, with an etch rate of >80 nm/min at a pressure of 6 mTorr. The experiments were developed for structuring Fabry–Pérot filters for tunable optical sensor arrays.

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© 2010 Society of Photo-Optical Instrumentation Engineers

Citation

Onny Setyawati ; Markus Engenhorst ; Martin Bartels ; Vadim Daneker ; Stefan Wittzack, et al.
"Characterization of dry etching of TiO2/SiO2 distributed Bragg reflectors for tunable optical sensor arrays", J. Micro/Nanolith. MEMS MOEMS. 9(4), 041110 (December 28, 2010). ; http://dx.doi.org/10.1117/1.3524828


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