Special Section on Line-Edge Roughness

Stochastic modeling of photoresist development in two and three dimensions

[+] Author Affiliations
Chris A. Mack

1605 Watchhill Road, Austin, Texas 78703

J. Micro/Nanolith. MEMS MOEMS. 9(4), 041202 (November 16, 2010). doi:10.1117/1.3494607
History: Received March 03, 2010; Revised June 03, 2010; Accepted June 16, 2010; Published November 16, 2010; Online November 16, 2010
Text Size: A A A

The concepts of dynamical scaling in the study of kinetic roughness are applied to the problem of photoresist development. Uniform, open-frame exposure and development of photoresist corresponds to the problem of quenched noise and the etching of random disordered media and is expected to fall in the Kadar-Parisi-Zhang (KPZ) universality class for the case of fast development. To verify this expectation, simulations of photoresist development in 1+1 and 2+1 dimensions were carried out with various amounts of random, uncorrelated noise added to an otherwise uniform development rate. The resulting roughness exponent α and the growth exponent β were found to match the KPZ values nearly exactly. The impact of the magnitude of the underlying development randomness on the values of these exponents was also determined, and an empirical expression for predicting the kinetic roughness over a wide range of conditions is presented.

Figures in this Article
© 2010 Society of Photo-Optical Instrumentation Engineers

Citation

Chris A. Mack
"Stochastic modeling of photoresist development in two and three dimensions", J. Micro/Nanolith. MEMS MOEMS. 9(4), 041202 (November 16, 2010). ; http://dx.doi.org/10.1117/1.3494607


Tables

Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement


 

  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.