Special Section on Line-Edge Roughness

Mesoscale simulation of line-edge structures based on polymer chains in development and rinse processes

[+] Author Affiliations
Hiroshi Morita

National Institute of Advanced Industrial Science and Technology, Nanosystem Research Institute, Central 2-1 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan

Masao Doi

The University of Tokyo, Department of Applied Physics, 7-3-1, Hongo, Bunkyo, Tokyo, 113-8656. Japan

J. Micro/Nanolith. MEMS MOEMS. 9(4), 041213 (December 28, 2010). doi:10.1117/1.3530593
History: Received April 02, 2010; Revised November 09, 2010; Accepted November 16, 2010; Published December 28, 2010; Online December 28, 2010
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To study line-edge roughness (LER), we develop a simulation method for the formation process of line edges based on the mesoscale simulation of the dissipative particle dynamics (DPD) method. We model the development and rinse processes based on the coarse-grained resist polymer model. It is important that the block copolymer in which the soluble and insoluble blocks are bonded exists at the line edge. Though the soluble part of this block copolymer is stretched out in the development process, it shrinks in the rinse process. The shrunken polymers contribute to the formation of line edges, and LER is very influenced by these polymers. Our simulations help to analyze the formation process of line edges based on resist polymer chain dynamics.

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© 2010 Society of Photo-Optical Instrumentation Engineers

Citation

Hiroshi Morita and Masao Doi
"Mesoscale simulation of line-edge structures based on polymer chains in development and rinse processes", J. Micro/Nanolith. MEMS MOEMS. 9(4), 041213 (December 28, 2010). ; http://dx.doi.org/10.1117/1.3530593


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