Special Section on Metrology

Alignment and averaging of scanning electron microscope image contours for optical proximity correction modeling purposes

[+] Author Affiliations
Peter De Bisschop

IMEC, Kapeldreef 75, B-3001 Leuven,Belgium

Jeroen Van de Kerkhove

IMEC, Kapeldreef 75, B-3001 Leuven,Belgium

J. Micro/Nanolith. MEMS MOEMS. 9(4), 041302 (December 01, 2010). doi:10.1117/1.3514704
History: Received May 29, 2010; Revised August 03, 2010; Accepted September 21, 2010; Published December 01, 2010; Online December 01, 2010
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When measured scanning electron microscope (SEM) image contours are used to generate or verify optical proximity correction (OPC) models, it is important that the contours are correctly aligned. If this is not the case, alignment errors will negatively impact the OPC model quality or its verification result. We present the approach we have developed to accurately align SEM contours for a variety of structure types. We discuss what one should align them to and how to do this, making the distinction between the case where the contours are to be used for verification of an already existing OPC model, or for generation of an OPC model. We show that our approach to contour alignment also offers the possibility to do contour averaging. We demonstrate the validity and limitations of our approach for a large number of SEM contours, taken from a 22-nm random-logic poly-type application.

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© 2010 Society of Photo-Optical Instrumentation Engineers

Citation

Peter De Bisschop and Jeroen Van de Kerkhove
"Alignment and averaging of scanning electron microscope image contours for optical proximity correction modeling purposes", J. Micro/Nanolith. MEMS MOEMS. 9(4), 041302 (December 01, 2010). ; http://dx.doi.org/10.1117/1.3514704


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