Mueller matrix measurement of asymmetric gratings

Jie Li; Justin J. Hwu; Yongdong Liu; Silvio Rabello; Zhuan Liu; Jiangtao Hu

doi:10.1117/1.3514708

1 October 2010 Mueller matrix measurement of asymmetric gratings

Jie Li, Justin J. Hwu, Yongdong Liu, Silvio Rabello, Zhuan Liu, Jiangtao Hu

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 9, Issue 4, 041305 (October 2010). https://doi.org/10.1117/1.3514708

Abstract

Scatterometry has been used extensively for the characterization of critical dimensions (CDs) and detailed sidewall profiles of periodic structures in microelectronics fabrication processes. In most cases devices are designed to be symmetric, although errors could occur during the fabrication process and result in undesired asymmetry. Conventional optical scatterometry techniques have difficulties distinguishing between left and right asymmetries. We investigate the possibility of measuring grating asymmetry with Mueller matrix spectroscopic ellipsometry (MM-SE) for a patterned hard disk sample prepared by a nanoimprint technique. The relief image on the disk sometimes has an asymmetrical sidewall profile, presumably due to the uneven separation of the template from the disk. Cross section SEM reveals that asymmetrical resist lines are typically tilted toward the outer diameter direction. Simulation and experimental data show that certain Mueller matrix elements are proportional to the direction and amplitude of profile asymmetry, providing a direct indication to the sidewall tilting. The tilting parameter can be extracted using rigorous optical critical dimension (OCD) modeling or calibration methods. We demonstrate that this technique has good sensitivity for measuring and distinguishing left and right asymmetry caused by sidewall tilting, and can therefore be used for monitoring processes for which symmetric structures are desired.

©(2010) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Jie Li, Justin J. Hwu, Yongdong Liu, Silvio Rabello, Zhuan Liu, and Jiangtao Hu "Mueller matrix measurement of asymmetric gratings," Journal of Micro/Nanolithography, MEMS, and MOEMS 9(4), 041305 (1 October 2010). https://doi.org/10.1117/1.3514708

Published: 1 October 2010

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available