Special Section on Metrology

Scatterometry characterization of spacer double patterning structures

[+] Author Affiliations
Prasad Dasari

Nanometrics Inc., 1550 Buckeye Drive, Milpitas, California 95035

Jiangtao Hu

Nanometrics Inc., 1550 Buckeye Drive, Milpitas, California 95035

Zhuan Liu

Nanometrics Inc., 1550 Buckeye Drive, Milpitas, California 95035

Asher Tan

Nanometrics Inc., 1550 Buckeye Drive, Milpitas, California 95035

Oleg Kritsun

GLOBALFOUNDRIES, 1050 E. Arques Avenue, Sunnyvale, California 94085

Catherine Volkman

GLOBALFOUNDRIES, 1050 E. Arques Avenue, Sunnyvale, California 94085

Chris Bencher

Applied Materials, Inc., 3225 Oakmead Village Drive, Santa Clara, California 95054

J. Micro/Nanolith. MEMS MOEMS. 9(4), 041309 (December 30, 2010). doi:10.1117/1.3531999
History: Received April 01, 2010; Revised November 04, 2010; Accepted November 29, 2010; Published December 30, 2010; Online December 30, 2010
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Double patterning technology overlay errors result in critical dimension (CD) distortions, and CD nonuniformity leads to overlay errors, demanding increased critical dimension uniformity (CDU) and improved overlay control. Scatterometry techniques are used to characterize the CD uniformity, focus, and dose control. We present CDU and profile characterization for spacer double patterning structures by advanced scatterometry methods. Our results include normal incidence spectroscopic reflectometry (NISR) and spectroscopic ellipsometry (SE) characterization of CDU sensitivity in spacer double patterning stacks. We further show the results of spacer DP structures by NISR and SE measurements. Metrology comparisons at various process steps including litho, etch, and spacer, and validation of CDU and profile, are all benchmarked against traditional critical dimension scanning electron microscope measurements.

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© 2010 Society of Photo-Optical Instrumentation Engineers

Citation

Prasad Dasari ; Jiangtao Hu ; Zhuan Liu ; Asher Tan ; Oleg Kritsun, et al.
"Scatterometry characterization of spacer double patterning structures", J. Micro/Nanolith. MEMS MOEMS. 9(4), 041309 (December 30, 2010). ; http://dx.doi.org/10.1117/1.3531999


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