Special Section on Metrology

Predicting substrate-induced focus error

[+] Author Affiliations
Bernhard Liegl

IBM Systems and Technology Group, 2070 Route 52, Hopewell Junction, New York 12533-3507

Brian Sapp, Stephen Greco

IBM Systems and Technology Group, 2070 Route 52, Hopewell Junction, New York 12533-3507

Timothy A. Brunner

IBM Systems and Technology Group, 2070 Route 52, Hopewell Junction, New York 12533-3507

Nelson Felix

IBM Systems and Technology Group, 2070 Route 52, Hopewell Junction, New York 12533-3507

Ian Stobert

IBM Systems and Technology Group, 2070 Route 52, Hopewell Junction, New York 12533-3507

Kourosh Nafisi

IBM Systems and Technology Group, 2070 Route 52, Hopewell Junction, New York 12533-3507

Chandrasekhar Sarma

Infineon Technologies, 2070 Route 52, Hopewell Junction, New York 12533-3507

J. Micro/Nanolith. MEMS MOEMS. 9(4), 041311 (January 03, 2011). doi:10.1117/1.3530580
History: Received May 14, 2010; Revised November 08, 2010; Accepted November 29, 2010; Published January 03, 2011; Online January 03, 2011
Text Size: A A A

The ever-shrinking lithography process window dictates that we maximize our process window, minimize process variation, and quantify the disturbances to an imaging process caused upstream of the imaging step. Relevant factors include across-wafer and wafer-to-wafer film thickness variation, wafer flatness, wafer edge effects, and design-induced topography. We present our effort to predict design-induced focus error hot spots based on prior knowledge of the wafer surface topography. This knowledge of wafer areas challenging the edge of our process window enables a constructive discussion with our design and integration team to prevent or mitigate focus error hot spots upstream of the imaging process.

© 2010 Society of Photo-Optical Instrumentation Engineers

Citation

Bernhard Liegl ; Brian Sapp ; Stephen Greco ; Timothy A. Brunner ; Nelson Felix, et al.
"Predicting substrate-induced focus error", J. Micro/Nanolith. MEMS MOEMS. 9(4), 041311 (January 03, 2011). ; http://dx.doi.org/10.1117/1.3530580


Tables

Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.