Articles

Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method

[+] Author Affiliations
Yen-Min Lee

National Taiwan University, Department of Engineering Science and Ocean Engineering, 1, Sec. 4, Roosevelt Road, Taipei 10617, Taiwan

Jia-Han Li

National Taiwan University, Department of Engineering Science and Ocean Engineering, 1, Sec. 4, Roosevelt Road, Taipei 10617, Taiwan

Philip C. W. Ng

National Taiwan University, Department of Electrical Engineering, 1, Sec. 4, Roosevelt Road, Taipei 10617, Taiwan

Ting-Hang Pei

National Taiwan University, Department of Electrical Engineering, 1, Sec. 4, Roosevelt Road, Taipei 10617, Taiwan

Fu-Min Wang

National Taiwan University, Graduate Institute of Electronics Engineering, 1, Sec. 4, Roosevelt Road, Taipei 10617, Taiwan

Kuen-Yu Tsai

National Taiwan University, Department of Electrical Engineering and Graduate Institute of Electronics Engineering, National Taiwan University, 1, Sec. 4, Roosevelt Road, Taipei 10617, Taiwan

Alek C. Chen

ASML Taiwan Ltd., Technology Development Center, No. 59, Ke Ji 6th Rd., Gueishan, Taoyuan 33383, Taiwan

J. Micro/Nanolith. MEMS MOEMS. 9(4), 043003 (December 28, 2010). doi:10.1117/1.3503532
History: Received December 14, 2009; Revised August 17, 2010; Accepted September 01, 2010; Published December 28, 2010; Online December 28, 2010
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The modified transmission line theory is used to calculate equivalent refractive indices of the extreme ultraviolet (EUV) mask multilayer (ML) over wavelengths from 13.35 to 13.65 nm for finite-difference time-domain (FDTD) simulation. Generally speaking, a fine mesh requiring huge memory and computation time are necessary to get accurate results in an FDTD simulation. However, it is hard to get accurate results for ML simulation due to the thin thickness of each layer. By means of an equivalent refractive index, the ML can be treated as one layer with the bulk effective material. Using FDTD simulations, we study the reflectivities of 40 Mo/Si ML and bulk material cases. The ML structure and bulk material with periodic excessive surface roughness as well as patterned with periodic contact holes are also studied by using two- and three-dimensional FDTD simulations. The simulation cases for a single wavelength and for a full-bandwidth EUV light source with a 6 ML system are studied. The results from each simulation show that the root mean square error between ML simulations and the bulk material simulations are confined within 3.3%, and all cases indicate that the FDTD computation time of bulk material is about half as compared with a 40-ML simulation.

© 2010 Society of Photo-Optical Instrumentation Engineers

Citation

Yen-Min Lee ; Jia-Han Li ; Philip C. W. Ng ; Ting-Hang Pei ; Fu-Min Wang, et al.
"Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method", J. Micro/Nanolith. MEMS MOEMS. 9(4), 043003 (December 28, 2010). ; http://dx.doi.org/10.1117/1.3503532


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