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Design and fabrication of a micromachined bilayer cantilever probe card

[+] Author Affiliations
Xiangmeng Jing

National Key Laboratory of Nano/Micro Fabrication Technology, Key Laboratory for Thin Film and Microtechnology of Ministry of Education, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, 800 Dongchuan Road, Shanghai 200240, China and, Nanyang Technological University, School of Mechanical and Aerospace Engineering, 50 Nanyang Avenue, 639798, Singapore

Di Chen

National Key Laboratory of Nano/Micro Fabrication Technology, Key Laboratory for Thin Film and Microtechnology of Ministry of Education, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, 800 Dongchuan Road, Shanghai 200240, China

Xiang Chen

National Key Laboratory of Nano/Micro Fabrication Technology, Key Laboratory for Thin Film and Microtechnology of Ministry of Education, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, 800 Dongchuan Road, Shanghai 200240, China

Jianmin Miao

Nanyang Technological University, School of Mechanical and Aerospace Engineering, 50 Nanyang Avenue, 639798, Singapore

Jingquan Liu, Jun Zhu

National Key Laboratory of Nano/Micro Fabrication Technology, Key Laboratory for Thin Film and Microtechnology of Ministry of Education, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, 800 Dongchuan Road, Shanghai 200240, China

J. Micro/Nanolith. MEMS MOEMS. 9(4), 043005 (December 21, 2010). doi:10.1117/1.3517100
History: Received April 20, 2010; Revised September 27, 2010; Accepted October 04, 2010; Published December 21, 2010; Online December 21, 2010
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We present a bilayer cantilever microelectromechanical systems probe card configuration aiming to achieve an optimization of the mechanical and electrical properties of the probes. This bilayer cantilever structure is analyzed by an analytical method, and then further validated by finite element analysis. A prototype probe card structure is designed for the parallel I/O pads layout with a pitch of 100 μm, and developed via combining Si micromachining and ultraviolet Lithographie, Galvanoformung, Abformung (lithography, electroplating, and molding) (UV-LIGA) technique. The measured spring constant of the cantilever is 0.6362 Nm–1, close to the theoretical prediction. The resistance from the probe tip to the end of the Cu conductive line is as low as 0.035 Ω, indicating a very small electrical loss on the probe structure. In the radio frequency (rf) range of 0 to 40 MHz, the characteristic impedance is higher than 20 kΩ, while the capacitance between two adjacent probes is around 0.13 pF. These measurement data indicate that the designed cantilever probe card structure has a good rf isolation property that makes it suitable for the testing of high-speed signal ICs.

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© 2010 Society of Photo-Optical Instrumentation Engineers

Citation

Xiangmeng Jing ; Di Chen ; Xiang Chen ; Jianmin Miao ; Jingquan Liu, et al.
"Design and fabrication of a micromachined bilayer cantilever probe card", J. Micro/Nanolith. MEMS MOEMS. 9(4), 043005 (December 21, 2010). ; http://dx.doi.org/10.1117/1.3517100


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