Special Section on Theory and Practice of MEMS, NEMS, and MOEMS

New approaches of mold fabrication for nanoimprint lithography

[+] Author Affiliations
Chien-Hung Lin

Chinese Culture University, Department of Mechanical Engineering, 55, Hwa-Kang Road, Yang-Ming-Shan, Taipei, 11114 Taiwan

Rongshun Chen

Chinese Culture University, Department of Mechanical Engineering, 55, Hwa-Kang Road, Yang-Ming-Shan, Taipei, 11114 Taiwan

J. Micro/Nanolith. MEMS MOEMS. 10(1), 011506 (March 22, 2011). doi:10.1117/1.3564881
History: Received August 12, 2010; Revised February 17, 2011; Accepted February 21, 2011; Published March 22, 2011; Online March 22, 2011
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We present the new mold fabrications for nanoimprint lithography for the application of ordered array of rod or pore patterning. The concave and convex types of the mold are achieved. For this technology, the master is required preparation before the mold fabrication. The master is utilized by step and repeated to achieve the structures over a large area on the mold. The master, mold, and imprint results demonstrate that the new approaches of mold fabrication could be a feasible scheme with low cost and high throughput.

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© 2011 Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation

Chien-Hung Lin and Rongshun Chen
"New approaches of mold fabrication for nanoimprint lithography", J. Micro/Nanolith. MEMS MOEMS. 10(1), 011506 (March 22, 2011). ; http://dx.doi.org/10.1117/1.3564881


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