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Measurement traceability and quality assurance in a nanomanufacturing environment

[+] Author Affiliations
Ndubuisi G. Orji

National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, Maryland 20899–8212

Ronald G. Dixson

National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, Maryland 20899–8212

Aaron M. Cordes

International SEMATECH Manufacturing Initiative, 257 Fuller Road, Suite 2200, Albany, New York 12203

Benjamin D. Bunday

International SEMATECH Manufacturing Initiative, 257 Fuller Road, Suite 2200, Albany, New York 12203

John A. Allgair

GLOBALFOUNDRIES, Wilschdorfer Landstrasse 101, D-01109 Dresden, Germany

J. Micro/Nanolith. MEMS MOEMS. 10(1), 013006 (March 08, 2011). doi:10.1117/1.3549736
History: Received October 13, 2010; Accepted December 02, 2010; Published March 08, 2011; Online March 08, 2011
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A key requirement for nanomanufacturing is maintaining acceptable traceability of measurements performed to determine size. Given that properties and functionality at the nanoscale are governed by absolute size, maintaining the traceability of dimensional measurements of nanoscale devices is crucial to the success of nanomanufacturing. There are various strategies for introducing traceability into the nanomanufacturing environment. Some involve first principles, but most entail the use of calibrated artifacts. In an environment where different types of products are manufactured, it is challenging to maintain traceability across different products mix. In this paper, we present some of the work we have done in developing methods to track the traceability of dimensional measurements performed in a wafer fabrication facility. We combine the concepts of reference measurement system, measurement assurance, and metrological timelines to ensure that traceability is maintained through a series of measurements that involve different instruments and product mixes, spanning a four-year period. We show how to use knowledge of process-induced and instrument systematic errors, among others, to ensure that the traceability of the measurements is maintained.

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© 2011 Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation

Ndubuisi G. Orji ; Ronald G. Dixson ; Aaron M. Cordes ; Benjamin D. Bunday and John A. Allgair
"Measurement traceability and quality assurance in a nanomanufacturing environment", J. Micro/Nanolith. MEMS MOEMS. 10(1), 013006 (March 08, 2011). ; http://dx.doi.org/10.1117/1.3549736


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