Articles

Fabrication of submicron metallic grids with interference and phase-mask holography

[+] Author Affiliations
Joong-Mok Park

U.S. Department of Energy, Ames Laboratory, 317 Zaffarano, Ames, Iowa 50011 and Iowa State University, Department of Physics and Astronomy, Ames, Iowa 50011

Tae-Geun Kim

Korea University, School of Electrical Engineering, Seoul, 136-701, Korea

Kristen Constant

U.S. Department of Energy, Ames Laboratory, Ames, Iowa 50011 and Iowa State University, Department of Materials Science and Engineering, Ames, Iowa 50011

Kai-Ming Ho

U.S. Department of Energy, Ames Laboratory, Ames, Iowa 50011 and Iowa State University, Department of Physics and Astronomy Ames, Iowa 50011

J. Micro/Nanolith. MEMS MOEMS. 10(1), 013011 (January 25, 2011). doi:10.1117/1.3541794
History: Received October 13, 2010; Revised December 06, 2010; Accepted December 17, 2010; Published January 25, 2011; Online January 25, 2011
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Complex, submicron Cu metallic mesh nanostructures are made by electrochemical deposition using polymer templates made from photoresist. The polymer templates are fabricated with photoresist using two-beam interference holography and phase mask holography with three diffracted beams. Freestanding metallic mesh structures are made in two separate electrodepositions with perpendicular photoresist grating templates. Cu mesh square nanostructures having large (52.6%) open areas are also made by single electrodeposition with a photoresist template made with a phase mask. These structures have potential as electrodes in photonic devices.

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© 2011 Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation

Joong-Mok Park ; Tae-Geun Kim ; Kristen Constant and Kai-Ming Ho
"Fabrication of submicron metallic grids with interference and phase-mask holography", J. Micro/Nanolith. MEMS MOEMS. 10(1), 013011 (January 25, 2011). ; http://dx.doi.org/10.1117/1.3541794


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