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Multilaboratory comparison of traceable atomic force microscope measurements of a 70-nm grating pitch standard

[+] Author Affiliations
Ronald Dixson

National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, Maryland 20899–8212

Donald A. Chernoff

Advanced Surface Microscopy, 3250 North Post Road, Suite 120, Indianapolis, Indiana 46226

Shihua Wang

National Metrology Centre, A*STAR, 1 Science Park Drive, Singapore 118221

Theodore V. Vorburger

National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, Maryland 20899–8212

Siew-Leng Tan

National Metrology Centre, A*STAR, 1 Science Park Drive, Singapore 118221

Ndubuisi G. Orji

National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, Maryland 20899–8212

Joseph Fu

National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, Maryland 20899–8212

J. Micro/Nanolith. MEMS MOEMS. 10(1), 013015 (March 08, 2011). doi:10.1117/1.3549914
History: Received September 20, 2010; Revised December 16, 2010; Accepted December 30, 2010; Published March 08, 2011; Online March 08, 2011
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The National Institute of Standards and Technology (NIST), Advanced Surface Microscopy (ASM), and the National Metrology Centre (NMC) of the Agency for Science, Technology, and Research (A*STAR) in Singapore have completed a three-way interlaboratory comparison of traceable pitch measurements using atomic force microscopy (AFM). The specimen being used for this comparison is provided by ASM and consists of SiO2 lines having a 70-nm pitch patterned on a silicon substrate. For this comparison, NIST used its calibrated atomic force microscope (C-AFM), an AFM with incorporated displacement interferometry, to participate in this comparison. ASM used a commercially available AFM with an open-loop scanner, calibrated with a 144-nm pitch transfer standard. NMC/A*STAR used a large scanning range metrological atomic force microscope with He-Ne laser displacement interferometry incorporated. The three participants have independently established traceability to the SI (International System of Units) meter. The results obtained by the three organizations are in agreement within their expanded uncertainties and at the level of a few parts in 104.

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© 2011 Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation

Ronald Dixson ; Donald A. Chernoff ; Shihua Wang ; Theodore V. Vorburger ; Siew-Leng Tan, et al.
"Multilaboratory comparison of traceable atomic force microscope measurements of a 70-nm grating pitch standard", J. Micro/Nanolith. MEMS MOEMS. 10(1), 013015 (March 08, 2011). ; http://dx.doi.org/10.1117/1.3549914


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