Articles

Fast algorithm for quadratic aberration model in optical lithography based on cross triple correlation

[+] Author Affiliations
Shiyuan Liu

Huazhong University of Science and Technology, Wuhan National Laboratory for Optoelectronics, 1037 Luoyu Road, Wuhan 430074, China, and, Huazhong University of Science and Technology, State Key Laboratory of Digital Manufacturing Equipment and Technology, Wuhan 430074, China

Wei Liu

Huazhong University of Science and Technology, Wuhan National Laboratory for Optoelectronics, Wuhan 430074, China

Tingting Zhou

Huazhong University of Science and Technology, State Key Laboratory of Digital Manufacturing Equipment and Technology, Wuhan 430074, China

J. Micro/Nanolith. MEMS MOEMS. 10(2), 023007 (May 16, 2011). doi:10.1117/1.3586797
History: Received January 27, 2011; Revised April 04, 2011; Accepted April 12, 2011; Published May 16, 2011; Online May 16, 2011
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The quadratic aberration model used in optical lithography is a natural extension of the linear model by taking into account interactions among individual Zernike coefficients. Although the model has been tested and verified in many applications, the effects of Zernike coefficients under partially coherent imaging are usually obtained by extensive experiments due to the complexity of the model expression. In this paper, a generalized cross triple correlation (CTC) is introduced and a fast algorithm to simulate the quadratic aberration model is developed. Simulations were performed by the proposed CTC-based algorithm with different input Zernike aberrations for binary and phase shift masks with multiple pitches and orientations, which demonstrate that the proposed approach is not only accurate but also efficient for revealing the influence of different Zernike orders on aerial image intensity distributions under partially coherent illumination.

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© 2011 Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation

Shiyuan Liu ; Wei Liu and Tingting Zhou
"Fast algorithm for quadratic aberration model in optical lithography based on cross triple correlation", J. Micro/Nanolith. MEMS MOEMS. 10(2), 023007 (May 16, 2011). ; http://dx.doi.org/10.1117/1.3586797


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