Fast algorithm for quadratic aberration model in optical lithography based on cross triple correlation

Shiyuan Liu; Wei Liu; Tingting Zhou

doi:10.1117/1.3586797

1 April 2011 Fast algorithm for quadratic aberration model in optical lithography based on cross triple correlation

Shiyuan Liu, Wei Liu, Tingting Zhou

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 10, Issue 2, 023007 (April 2011). https://doi.org/10.1117/1.3586797

Abstract

The quadratic aberration model used in optical lithography is a natural extension of the linear model by taking into account interactions among individual Zernike coefficients. Although the model has been tested and verified in many applications, the effects of Zernike coefficients under partially coherent imaging are usually obtained by extensive experiments due to the complexity of the model expression. In this paper, a generalized cross triple correlation (CTC) is introduced and a fast algorithm to simulate the quadratic aberration model is developed. Simulations were performed by the proposed CTC-based algorithm with different input Zernike aberrations for binary and phase shift masks with multiple pitches and orientations, which demonstrate that the proposed approach is not only accurate but also efficient for revealing the influence of different Zernike orders on aerial image intensity distributions under partially coherent illumination.

©(2011) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Shiyuan Liu, Wei Liu, and Tingting Zhou "Fast algorithm for quadratic aberration model in optical lithography based on cross triple correlation," Journal of Micro/Nanolithography, MEMS, and MOEMS 10(2), 023007 (1 April 2011). https://doi.org/10.1117/1.3586797

Published: 1 April 2011

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