Errata

Errata: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects

[+] Author Affiliations
Philip C. W. Ng, Kuen-Yu Tsai

National Taiwan University, Department of Electrical Engineering, No. 1, Sec. 4, Roosevelt Road, Taipei 10617, Taiwan

Yen-Min Lee

National Taiwan University, Department of Engineering Science and Ocean Engineering, No. 1, Sec. 4, Roosevelt Road, Taipei 10617, Taiwan

Fu-Min Wang

National Taiwan University, Graduate Institute of Electronics Engineering, No. 1, Sec. 4, Roosevelt Road, Taipei 10617, Taiwan

Jia-Han Li

National Taiwan University, Department of Engineering Science and Ocean Engineering, No. 1, Sec. 4, Roosevelt Road, Taipei 10617, Taiwan

Alek C. Chen

ASML Taiwan Ltd., Technology Development Center, No. 59, Ke Ji 6th Road, Gueishan, Taoyuan 33383, Taiwan

J. Micro/Nanolith. MEMS MOEMS. 10(2), 029801 (April 29, 2011). doi:10.1117/1.3576188
History: Published April 29, 2011; Online April 29, 2011
Text Size: A A A

Open Access Open Access

This article [] was originally published online 10 March 2011 with an error in the algorithm appearing on page 8.

In Step 3, the formula was incorrectly displayed as “J = 0”. The correct formula is “j = 0”.

All versions of the article were corrected on 23 March 2011. The article appears correctly online and in print.

© 2011 Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation

Philip C. W. Ng ; Kuen-Yu Tsai ; Yen-Min Lee ; Fu-Min Wang ; Jia-Han Li, et al.
"Errata: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects", J. Micro/Nanolith. MEMS MOEMS. 10(2), 029801 (April 29, 2011). ; http://dx.doi.org/10.1117/1.3576188


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