Articles

Solid-immersion Lloyd's mirror as a testbed for plasmon-enhanced ultrahigh numerical aperture lithography

[+] Author Affiliations
Prateek Mehrotra

University of Canterbury, MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Electrical and Computer, Engineering, 20 Kirkwood Avenue, Christchurch, Canterbury 8041 New Zealand

Charles W. Holzwarth

University of Canterbury, MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Electrical and Computer, Engineering, 20 Kirkwood Avenue, Christchurch, Canterbury 8041 New Zealand

Richard J. Blaikie

University of Canterbury, MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Electrical and Computer, Engineering, 20 Kirkwood Avenue, Christchurch, Canterbury 8041 New Zealand

J. Micro/Nanolith. MEMS MOEMS. 10(3), 033012 (August 25, 2011). doi:10.1117/1.3624516
History: Received April 06, 2011; Revised June 19, 2011; Accepted July 20, 2011; Published August 25, 2011; Online August 25, 2011
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Evanescent-wave imaging is demonstrated using solid-immersion Lloyd's mirror interference lithography at λ = 325 nm to produce 44-nm half-pitch structures (numerical aperture, NA = 1.85). At such an ultrahigh NA the image depth is severely compromised due to the evanescent nature of the exposure, and the use of reflections from plasmonic underlayers is discussed as a possible solution. Simulations and modeling show that image depths in excess of 100 nm should be possible with such a system, using silver as the plasmonic material. The concept is scalable to 193 nm illumination using aluminium as the plasmonic reflector, and simulation results are shown for 26-nm half-pitch imaging into a 37-nm thick resist layer using this scheme.

© 2011 Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation

Prateek Mehrotra ; Charles W. Holzwarth and Richard J. Blaikie
"Solid-immersion Lloyd's mirror as a testbed for plasmon-enhanced ultrahigh numerical aperture lithography", J. Micro/Nanolith. MEMS MOEMS. 10(3), 033012 (August 25, 2011). ; http://dx.doi.org/10.1117/1.3624516


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