Articles

Novel microelectromechanical systems image reversal fabrication process based on robust SU-8 masking layers

[+] Author Affiliations
Scott A. Ostrow

Air Force Institute of Technology, 2950 Hobson Way, Wright-Patterson AFB, Ohio 45433

Ronald A. Coutu

Air Force Institute of Technology, 2950 Hobson Way, Wright-Patterson AFB, Ohio 45433

J. Micro/Nanolith. MEMS MOEMS. 10(3), 033016 (September 02, 2011). doi:10.1117/1.3625633
History: Received February 26, 2011; Revised July 14, 2011; Accepted July 27, 2011; Published September 02, 2011; Online September 02, 2011
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This paper discusses a novel fabrication process that uses a combination of negative and positive photoresists with positive tone photomasks, resulting in masking layers suitable for bulk micromachining high-aspect ratio microelectromechanical systems (MEMS) devices. MicroChem's negative photoresist Nano™ SU-8 and Clariant's image reversal photoresist AZ 5214E are utilized, along with a barrier layer, to effectively convert a positive photomask into a negative image. This technique utilizes standard photolithography chemicals, equipment, and processes, and opens the door for creating complementary MEMS structures without added fabrication delay and cost. Furthermore, the SU-8 masking layer is robust enough to withstand aggressive etch chemistries needed for fabrication research and development, bulk micromachining high-aspect ratio MEMS structures in silicon substrates, etc. This processing technique was successfully demonstrated by translating a positive photomask to an SU-8 layer that was then utilized as an etching mask for a series of trenches that were micromachined into a silicon substrate. In addition, whereas the SU-8 mask would normally be left in place after processing, a technique utilizing Rohm and Haas Microposit™ S1818 as a release layer has been developed so that the SU-8 masking material can be removed post-etching.

© 2011 Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation

Scott A. Ostrow, II and Ronald A. Coutu, Jr.
"Novel microelectromechanical systems image reversal fabrication process based on robust SU-8 masking layers", J. Micro/Nanolith. MEMS MOEMS. 10(3), 033016 (September 02, 2011). ; http://dx.doi.org/10.1117/1.3625633


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