Highly sensitive and fast scanner focus monitoring method using forbidden pitch pattern

Jinseok Heo; Jeong-Ho Yeo; Young-Hee Kim

doi:10.1117/1.3658022

1 October 2011 Highly sensitive and fast scanner focus monitoring method using forbidden pitch pattern

Jinseok Heo, Jeong-Ho Yeo, Young-Hee Kim

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 10, Issue 4, 043011 (October 2011). https://doi.org/10.1117/1.3658022

Abstract

Forbidden pitches that are introduced under certain illumination conditions can have extremely narrow depth of focus (DOF), so that when a lithographic pattern is transferred to a wafer, the forbidden pitch should be removed from the layout. However, the sensitivity of this narrow DOF can be utilized to monitor focus changes in the scanner system itself. In this paper, a newly developed focus monitoring method utilizing the forbidden pitches is introduced and the sensitivity and advantages of this method are discussed in detail.

©(2011) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Jinseok Heo, Jeong-Ho Yeo, and Young-Hee Kim "Highly sensitive and fast scanner focus monitoring method using forbidden pitch pattern," Journal of Micro/Nanolithography, MEMS, and MOEMS 10(4), 043011 (1 October 2011). https://doi.org/10.1117/1.3658022

Published: 1 October 2011

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available