Articles

Wavefront-based pixel inversion algorithm for generation of subresolution assist features

[+] Author Affiliations
Jue-Chin Yu

National Chiao Tung University, Department of Photonics and Institute of Electro-Optical Engineering, 1001 Da-hsueh Road, Hsinchu 30050, Taiwan

Peichen Yu

National Chiao Tung University, Department of Photonics and Institute of Electro-Optical Engineering, 1001 Da-hsueh Road, Hsinchu 30050, Taiwan

Hsueh-Yung Chao

ANSYS, Inc., 225 West Station Square Drive, Suite 200, Pittsburgh, Pennsylvania 15219

J. Micro/Nanolith. MEMS MOEMS. 10(4), 043014 (December 01, 2011). doi:10.1117/1.3663249
History: Received March 29, 2011; Revised October 04, 2011; Accepted November 02, 2011; Published December 01, 2011; Online December 01, 2011
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The generation of subresolution assist features (SRAFs) using inverse-lithography techniques demands extensive computational resources which limits its deployment in advanced CMOS nodes. In this paper, we propose a wavefront-based pixel inversion algorithm to quickly obtain inverse masks with a high aerial image quality. Further assisted by a flexible pattern simplification technique, we present effective SRAF generation and placement based on the calculated inverse mask. The proposed approach can be easily inserted prior to a conventional mask correction flow for subsequent concurrent optimizations of both drawn patterns and SRAFs. The innovative pixel inversion and pattern simplification techniques allow quality mask corrections as produced by inverse lithography while maintaining the convenience of standardized/validated process flows currently used in the industry.

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© 2011 Society of Photo-Optical Instrumentation Engineers (SPIE)

Topics

Wavefronts ; SRAF

Citation

Jue-Chin Yu ; Peichen Yu and Hsueh-Yung Chao
"Wavefront-based pixel inversion algorithm for generation of subresolution assist features", J. Micro/Nanolith. MEMS MOEMS. 10(4), 043014 (December 01, 2011). ; http://dx.doi.org/10.1117/1.3663249


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