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Special Section on Dimensional Metrology with Atomic Force Microscopy: Instruments and Applications

Traceable calibration of a critical dimension atomic force microscope

[+] Author Affiliations
Ronald Dixson

National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, Maryland 20899

Ndubuisi G. Orji

National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, Maryland 20899

Craig D. McGray

National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, Maryland 20899

John Bonevich, Jon Geist

National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, Maryland 20899

J. Micro/Nanolith. MEMS MOEMS. 11(1), 011006 (Mar 08, 2012). doi:10.1117/1.JMM.11.1.011006
History: Received July 13, 2011; Revised September 1, 2011; Accepted September 14, 2011
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Abstract.  The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. One component of this program, and the focus of this paper, is the use of critical dimension atomic force microscopy (CD-AFM). CD-AFM is a commercially available AFM technology that uses flared tips and two-dimensional surface sensing to scan the sidewalls of near-vertical or even reentrant features. Features of this sort are commonly encountered in semiconductor manufacturing and other nanotechnology industries.

Abstract.  NIST has experience in the calibration and characterization of CD-AFM instruments and in the development of uncertainty budgets for typical measurements in semiconductor manufacturing metrology. A third generation CD-AFM was recently installed at NIST. The current performance of this instrument for pitch and height measurements generally supports our relative expanded uncertainty (k=2) goals in the range of 2.0×103 and lower.

Abstract.  Additionally, a new generation of the NIST single crystal critical dimension reference material (SCCDRM) project is pushing toward feature widths below 10 nm, with the prospect of CD-AFM tip width calibration having expanded uncertainty (k=2) below 1 nm.

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© 2012 Society of Photo-Optical Instrumentation Engineers

Citation

Ronald Dixson ; Ndubuisi G. Orji ; Craig D. McGray ; John Bonevich and Jon Geist
"Traceable calibration of a critical dimension atomic force microscope", J. Micro/Nanolith. MEMS MOEMS. 11(1), 011006 (Mar 08, 2012). ; http://dx.doi.org/10.1117/1.JMM.11.1.011006


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