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Hydrogen silsesquioxane resist stamp for replication of nanophotonic components in polymers

[+] Author Affiliations
Muhammad Rizwan Saleem

University of Eastern Finland, Department of Physics and Mathematics, P. O. Box 111, FIN-80101, Joensuu, Finland

National University of Sciences and Technology, School of Chemical and Materials Engineering, Sector H-12, Islamabad, Pakistan

Petri Antero Stenberg, Jari Turunen

University of Eastern Finland, Department of Physics and Mathematics, P. O. Box 111, FIN-80101, Joensuu, Finland

Muhammad Bilal Khan, Zaffar Muhammad Khan

National University of Sciences and Technology, School of Chemical and Materials Engineering, Sector H-12, Islamabad, Pakistan

Seppo Honkanen

University of Eastern Finland, Department of Physics and Mathematics, P. O. Box 111, FIN-80101, Joensuu, Finland

Aalto University, Department of Micro and Nanosciences, P.O. Box 13500, FI-00076 Aalto, Espoo, Finland

J. Micro/Nanolith. MEMS MOEMS. 11(1), 013007 (Mar 02, 2012). doi:10.1117/1.JMM.11.1.013007
History: Received January 5, 2012; Revised January 19, 2012; Accepted January 25, 2012
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Abstract.  We investigate an affordable, accurate and large-scale production method to fabricate subwavelength grating structures by hot embossing replication in polycarbonate substrates. We use inorganic hydrogen silsesquioxane (HSQ), a high resolution, binary, negative electron beam resist, on silicon substrate to make a stamp for replication. The stamp is fabricated without any etching processes and with simple process steps. The process starts by spin coating an HSQ-resist layer on a silicon substrate. The desired film thickness is achieved by adjusting the spinning speed and time. The resist material is then subjected to e-beam writing and development followed by a heat treatment to enhance the hardness and to obtain hot embossing stamp material properties comparable with solid SiO2. A comparison with and without the silicon etching is also performed. We demonstrate that a high quality stamp for thermal nano-imprint lithography for optical gratings can be fabricated using an inexpensive process without an etching step. The process results in a uniform imprinting density over the entire grating surface and high imprint fidelity. The reflectance spectra of replicated grating structures are also shown to be in agreement with theoretical calculations.

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© 2012 Society of Photo-Optical Instrumentation Engineers

Citation

Muhammad Rizwan Saleem ; Petri Antero Stenberg ; Muhammad Bilal Khan ; Zaffar Muhammad Khan ; Seppo Honkanen, et al.
"Hydrogen silsesquioxane resist stamp for replication of nanophotonic components in polymers", J. Micro/Nanolith. MEMS MOEMS. 11(1), 013007 (Mar 02, 2012). ; http://dx.doi.org/10.1117/1.JMM.11.1.013007


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